Description
I. Basic Information
Part Number：0190-38324
Manufacturer：Applied Materials (AMAT)
Component Type：Process Heater Assembly
Compatible System：AMAT Centura / Endura Etch, PVD, CVD Process Tools
Function Location：Chamber Base Heater, ESC Temperature Control Unit, Process Chamber Thermal Stabilization Module
Product Description：The 0190-38324 is a high-precision process heater assembly designed for semiconductor wafer fabrication vacuum chambers. It provides uniform and stable thermal field for etching and thin-film deposition processes, ensuring consistent wafer temperature, uniform film thickness and stable process yield. It features plasma resistance, chemical corrosion resistance, high insulation stability and long service life, serving as a critical core component for equipment maintenance and spare part replacement.
Specifications
- Working Temperature Range：RT ~ 450℃
- Temperature Control Accuracy：±1℃ Steady-state Uniformity
- Working Environment：High Vacuum 10⁻⁶~10⁻⁹ Torr, Plasma & Corrosive Process Gas
- Insulation Performance：High dielectric strength, no leakage or breakdown under high temperature vacuum
- Cleanliness Level：Semiconductor Ultra-clean Grade, non-particle, non-volatile residue
- Service Life：18~24 months under standard mass production conditions
Key Features
1. Uniform Thermal Field & High Precision
Multi-loop balanced heating design minimizes wafer temperature gradient, ensuring uniform etching and deposition quality and improving wafer yield.
2. Excellent Plasma & Chemical Resistance
Special anti-corrosion structure resists long-term plasma bombardment and corrosive gas erosion, preventing delamination, powdering and thermal attenuation.
3. Stable Insulation & High Safety
Maintains stable insulation resistance under high temperature and high vacuum, effectively avoiding electric leakage, arcing and equipment failure.
4. Fast Thermal Response & Repeatability
Linear temperature rising characteristic with stable thermal inertia ensures high batch-to-batch process consistency.
5. Full Original Compatibility
100% match with original installation size, interface and electrical parameters, supporting direct replacement without modification.
II. Working Principle
The heater assembly is installed inside the process chamber base. The control system supplies rated power to the heating circuit to generate uniform Joule heat and stabilize the wafer platform temperature. The integrated temperature sensing unit feeds real-time temperature data back to the controller to realize closed-loop power adjustment, maintaining precise and stable thermal field during wafer etching and thin-film deposition processes. The anti-corrosion and insulating structure ensures long-term stable heating performance in harsh vacuum plasma environments.
III. Application Scenarios
1. Thermal stabilization for AMAT PVD/CVD thin-film deposition chambers.
2. Temperature uniformity control for semiconductor etching process chambers.
3. Equipment annual overhaul and aging heater replacement.
4. Troubleshooting of temperature drift, slow heating and thermal uniformity failure.
5. Semiconductor equipment spare part reserve and localization substitution.
